Welcome to Y.P.Lee, Mock & Partners
Hyuntae Cha


Mr. Cha received a BSc. in Metallurgical Engineering from Inha Univ. in 1999 and a Master’s Degree of IP from KAIST in 2012. He was admitted to Korea Patent Bar in 1999. Before joining the firm, he was associated with another IP law firm. He handles display device, battery, and semiconductor device.